Improvement of the structural properties of semiconductors and a positive impact on the environment when using optimized planarization methods
Alignment of the wafer surface, allowing to achieve a high degree of homogeneity of the electrophysical characteristics of semiconductors. Efficiency of using nanometer-sized abrasive particles and a modified composition of the polishing suspension.
| Рубрика | Физика и энергетика |
| Вид | статья |
| Язык | английский |
| Дата добавления | 09.12.2024 |
| Размер файла | 1,6 M |
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